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Vol. 177, Issue 8, August 2014, pp. 37-45

 

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Spectrum Calibration and Processing Research of Thin-Film Thickness Wideband Monitoring System
 

1 Xiaoyan SHANG, 1 Jun HAN, 2 Xu JIANG

1 School of Photoelectrical Engineering, Xi’an Technological University, Xi’an, 710032, China
2 Xi’an Institute of Applied Optics, Xi’an, 710065, China
1 Tel.: 029-86173335, fax: 029-86173335

1 E-mail: shaxiayan@126.com

 

Received: 2 July 2014 /Accepted: 4 August 2014 /Published: 31 August 2014

Digital Sensors and Sensor Sysstems

 

Abstract: In thin-film thickness wideband monitoring system, the monitoring effectiveness depends on the real-time and accurate measurement of the spectrum. To achieve the correct spectral signal in real-time, by analyzing the configuration of the spectrometer, the proper slit width of 0.14 mm was determined, the spectrum calibration function was achieved; The strong background noise was eliminated by subtracting the signal in the dark state from the signal in the adjacent bright state to the same pixel; the random noise was suppressed by the wavelet threshold optimization algorithm. Experimental result showed that the spectral resolution was less than 2 nm and the root-mean-square error of the wavelength calibrated was 0.037 nm; Background noise and random noise were well suppressed and the details of the spectrum signal were reserved, maximum of the peak error and the peak location of the spectral signal was 1.0 % and 0.3 % respectively. This improves the monitoring accuracy, thin film thickness monitoring error is less than 10-3.

 

Keywords: Real-time spectrum measurement, Thin-film thickness, Spectral resolution, Spectral calibration, Spectral noise processing.

 

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