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Vol. 228, Issue 12, December 2018, pp. 23-29




Feedback Process Control for Nano-manufacturing of Semiconductor Circuits

1 Wolf KOHN, 2 Anil NERODE and 3 Zelda B. ZABINSKY

1 Veritone, Inc., Costa Mesa CA, 92626, USA
2 Cornell University, Ithaca NY, 14853, USA
3 University of Washington, Seattle WA, 98195-2650, USA
1 Tel.: 206-790-0624

1 E-mail: wkohn@veritone.com


Received: 11 June 2018 /Accepted: 1 October 2018 /Published: 31 December 2018

Digital Sensors and Sensor Sysstems


Abstract: A feedback process control realizes 3-D circuits with a four nanometer footprint using a self-assembly nano-manufacturing facility including actuator controls. At this footprint level, quantum effects are significant. Our technology for quantizing the design of a digital circuit into a 3-D implementation using master equation models is based on a quantized Hamiltonian that is tracked by the physical Hamiltonian to deploy the circuit design. This quantum hybrid controller enables transformation of a desired circuit (expressed in logic and continuous rules) into manufacturing processes at quantum levels that includes interdependent multi-stage processes. The design procedure is interactive; it completely depends on the Hamiltonian of the circuit. It achieves performance criteria, such as maximize yield, maximize signal-to-noise ratio, and minimize entropy. The yield of the circuits is inversely proportional to the total entropy of the system. The Hamiltonian representation allows the computation of manufacturing parameters associated with this yield. Minimizing entropy produces high levels of yield.


Keywords: Self-assembly, Feedback control, Circuit optimization, Semi-conductor device fabrication, Scaffolding.


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