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Vol. 27, Special Issue, May 2014, pp. 137-141




Structural Characterization of Electrodeposited Nanostructured Titanium Dioxide thin Films
on Stainless Steel and on Indium Tin Oxide (ITO)

1 Fouzia CHERKAOUI EL MOURSLI, 2 Abdeslam DOUAYAR, 1 Faiza HAJJI, 4 Khalid NOUNEH, 3 Aicha GUESSOUS, 5 Khadija NABIH,
Adil HADRI and 2 Mohammed ABD-LEFDIL

1 Equipe Batteries Lithium et Dpts Electrolytiques, University Mohammed V-Agdal, Rabat, Morocco
2 Laboratory of Materials Physics, University Mohammed V Agdal, Rabat- Morocco
3 Laboratoire de Chimie Analytique et Electrochimie, University Mohammed V Agdal, Rabat, Morocco
4 Institute for Nanomaterials & Nanotechnology (INANOTECH), Moroccan Foundation for Advanced Science, Innovation and Research (MASCIR), Rabat, Morocco
5 Laboratoire de Chimie du Solide Appliqu?e, University Mohammed V Agdal, Rabat, Morocco
1 Tel.: +212 (0) 537778973

E-mail: fo-cherk@fsr.ac.ma; a-lefdil@fsr.ac.ma


Received: 31 December 2012 /Accepted: 10 August 2013 /Published: 26 May 2014

Digital Sensors and Sensor Sysstems


Abstract: Nanostructured TiO2 thin films are fabricated directly by an anodic electrodeposition using an aqueous TiCl3 solution. TiO2 thin films were deposited on stainless steel (SS) and indium tin oxide (ITO) substrates. As deposited, all TiO2 films were amorphous. For TiO2/stainless annealed at 350 C, XRD patterns show both anatase and rutile phases. While, only anatase phase subsists for annealing temperature at 450 C and 500 C. The calculated grain sizes are around 20 nm. By AFM analysis, surface root mean square (rms) roughness obtained for TiO2 /Steel is around 56 nm and decrease with annealing to 30 nm. For TiO2 thin films deposited on ITO and annealed at 350, 450, and 500 C, only orthorhombic single phase is observed with grains size of about 25 nm. The rms of as- deposited TiO2/ITO around 60 nm decrease with annealing to 40 nm confirming that annealing process improves the roughness of the as deposited samples.


Keywords: TiO2, Nanostructured thin films, Electrodeposition.


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