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Vol. 186, Issue 3, March 2015, pp. 173-176




Role of Annealing Temperature on Morphology of Alumina Thin Film Prepared
by Wet-Chemical Method

Manju Pandey, Prabhash Mishra, M. P. Singh, * S. S. Islam

Solidstate Electronics Research Laboratory (SERL), F/O Engineering and Technology, Jamia Millia Islamia (Central University), New Delhi, India
* Tel.: +011 26980532

E-mail: sislam@jmi.ac.in


Received: 7 January 2015 /Accepted: 27 February 2015 /Published: 31 March 2015

Digital Sensors and Sensor Sysstems


Abstract: In this paper, we reported the compositional, morphological and structural properties of the alumina(Al2O3) thin films prepared by sol-gel technique and annealed between 800 0C to 1200 0C for 1-hour in an air atmosphere. The deposited films were polycrystalline in nature. Thin films were found uniform and adherent to the alumina substrate. Effect of annealing temperature on structural parameters such as pore size and surface area were calculated. The result indicates that pore size and surface area was decreased by increasing annealing temperature. The material characterization was done by field emission scanning electron microscope (SEM), atomic force microscopy (AFM) and Brunaur, Emmet and Teller (BET).


Keywords: Sol-Gel, Alumina, Thin films, Porosity.


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