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Vol. 235, Issue 7, July 2019, pp. 15-22




A Novel 3D Integrated Circuit Technology Based on Stacked FinFET-CMOS Structure

*Jin HE, Yuan REN, Jun PAN, Jingjing LIU and Mansun CHAN

SoC Key Laboratory, Peking University Shenzhen Institute and PKU-HKUST Shenzhen-Hong Kong Institution, 518057, China
Tel.: 86-755-64321156, fax: 86-755-64321155

* E-mail: frankhe@pku.edu.cn


Received: 15 April 2019 /Accepted: 28 May 2019 /Published: 31 July 2019

Digital Sensors and Sensor Sysstems


Abstract: This paper describes a methodology to combine the most scalable FinFET structure and CMOS integration processing to form stacked FinFET-CMOS technology used in 3-D integration circuits. The scalability of the proposed 3-D technology in the nanocale dimension is achieved through the promise of the double- gate structure offered by the FinFETs. The stack FinFET-CMOS process is realized in FEOL processing and can achieve extremely high packing density, which results in the 40 to 60 % reduction of capacitive loading. Various standard cells have been re- designed by the FinFET-CMOS technology resulting in significant reduction in cell size. The advantages in conventional circuit performance with the new 3-D standard cell library have also been demonstrated.


Keywords: FinFET, 3-D integration circuits, Processing technology, Performance enhancement, Capacitive load.


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