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Vol. 115, Issue 4, April 2010, pp. 83-91




Electroplated Nickel Micromirror Array


1Mahmoud Almasri and 2Albert B. Frazier

1Department of Electrical and Computer Engineering, University of Missouri,
Columbia, MO 65211

2Department of Electrical and Computer Engineering, Georgia Institute of Technology,
Atlanta, GA 30332

E-mail: almasrim@missouri.edu



Received: 5 February 2010   /Accepted: 20 April 2010   /Published: 27 April 2010


Abstract: This paper presents the design, fabrication and testing of metallic micromirror array for use in Metal-Organic Molecular Beam Epitaxy system (MOMBE) to define the device structure and hence eliminate the need for etching and lithography. The micromirror is structurally composed of primarily electroplated nickel, a mechanically durable material with controllable residual stress. The high glass transition temperature of nickel allows it to be used without causing any contamination to the epitaxial systems or to the deposited materials. Each mirror is designed with hexagonal shape with a diameter of 0.5 mm to provide high fill factor. The torsion beams were designed with a straight bar and serpentine shape in order to optimize the voltage necessary to tilt the micromirror by 10o. The fabricated micromirrors with a plate thickness of 2.5 m and torsion beam length of 80 m, were rotated 6.84o by applying 65 V.


Keywords: Micromirror, Electroplated nickel, Metallic micromirror


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